Hot Wire Source "HWCV/DCAT-CVD/ICVD"
For catalytic CVD and iCVD applications! Integrated gas distribution system.
We provide hot wire sources for catalytic CVD and iCVD applications. Special linear energy sources are available for inline and dynamic film deposition processes. They consist of specially designed source flanges and quickly attachable wire components, which can reduce downtime of the wire components simply by replacing them on a unit-by-unit basis as needed. 【Features】 ■ Inorganic (e.g., SiH4) and organic (e.g., CxHy, plastic monomer precursors) materials can be used ■ Integrated gas distribution system ■ Continuous sheet, carrier, or roll-to-roll processes ■ Flexible operating positions: upward (limited), downward (limited), vertical ■ Adjustable wire spacing according to process requirements *For more details, please refer to the PDF document or feel free to contact us.
- Company：フォンアルデンヌジャパン
- Price：Other
